Multi-arc Ion Magnetron (MF) Sputtering Coating Equipment
Product Details:
| Machine Type | Glass Coating Machine |
|---|
Payment & Shipping Terms:
| Payment Terms: | L/C,T/T,Western Union |
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Detailed Product Description
Multi-arc Ion Magnetron (MF) Sputtering Vacuum Coating Equipment
Adopting unbalanced sputtering magnetic field structure.
Planar magnetron dual-targets closure magnetic field design.MF power supply is used for sputtering deposition of compound films, which can increase sputtering rate and effectively prevent the target poisoning, sparking and anode disappearance and therefore can greatly enhance ionization and obviously increase deposition rate.
Planar magnetron dual-targets closure magnetic field design.MF power supply is used for sputtering deposition of compound films, which can increase sputtering rate and effectively prevent the target poisoning, sparking and anode disappearance and therefore can greatly enhance ionization and obviously increase deposition rate.
Multi-arc Ion Magnetron (MF) Sputtering Coating Equipment
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Company Info
Zhaoqing City No.2 Machine Tool Works Co., Ltd.
[China (Mainland)]
[Verified Member]
City: Zhaoqing
Province/State: Guangdong
Country/Region : China (Mainland)
Business Type:Manufacturer, Trading Company
Online Postings: Products